|
|
Categories
» Electronics and Computer
» Process technology
| Nano-Strip™ strips and cleans organic and inorganic contamination |
| Country: |
United States of America |
| Link to your website: |
http://www.cyantek.com |
Description:
Nano-Strip™ strips and cleans organic and inorganic contamination effectively at room temperature or may be used at elevated temperatures to promote more effective stripping.
It contains no phenols, chlorinated solvents, and toxic fumes that can endanger operators or damage process equipment. Nano-Strip™ can be used in recirculating filtration tanks to prevent particle build-up, promote agitation, resulting in a longer bathlife.
Nano-Strip™ has a long extended bath life compared to standard Sulphuric Acid / Hydrogen Peroxide baths. Hazardous acid waste is minimized and the cost of waste treatment is dramatically reduced. Nano-Strip™ may reduce chemical volumes and therefore waste by as much as 70%.
Cyantek is a supplier of high purity process chemicals used in microlithography applications for the manufacturing of photomasks, wafer processing for semiconductors, thin film heads, storage discs, flat panel displays and other electronics applications.
The company was founded in 1977 to serve the needs of photomask manufacturers. In 1988 LaPorte Industries acquired Cyantek, combining their world renowned presence with the innovative products from Cyantek. In 1988, Cyantek introduced the Nano-Strip™ products for photomask and wafer resist stripping and cleaning. This popular product is a stabilized Sulfuric Acid and Hydrogen Peroxide mixture and is used worldwide, for stripping organic materials such as photoresist in photolithography processes and performing final cleans in mask making. |
|
|
 |
|
|
|
