|
|
Categories
» Industrial Nanotechnology Products
» Ultra Thin Film Applications
| MVD™-NanoFilms Molecular Vapor Deposition |
| Country: |
United States of America |
| Link to your website: |
http://www.appliedmst.com |
Description:
Molecular Vapor Deposition (MVD™) is a technology developed by AMST to deposit chemical precursors to form MVD™ NanoFilm products. The MVD™ technology is enhanced by state of the art surface preparation techniques that incorporates plasma. The plasma action is carried out at sub-atmospheric pressure which desorbs surface contaminants and moisture. AMST then uses a combination of proprietary packaging technology and the selection of specialized chemical precursors, coupled with the advanced chemical precursor delivery system of the MVD™100 and the MVD™150 to deposit NanoFilms with precision, repeatability and quality at a low cost.
The MVD™ Coating Process is environmentally friendly because it is solvent free, has low chemical consumption (µg/cycle), and does not generate waste.
The MVD™ NanoFilm process is an integrated low temperature deposition process carried out at sub-atmospheric pressure. The chemical surface reactions are self limiting by the number of reactive sites on the substrate (e.g. hydroxyl groups). This self-limiting mechanism allows for the deposition of conformal SAMs of uniform thickness (RMS < 5 Å) ranging from 5 to 30 Å. |
|
|
 |
|
|
|
